Semiconductor Electronics • Topic 1 of 3

Semiconductors & the p-n Junction

Solids are classified by how they conduct electricity, and the key to understanding why lies in the energy band theory. When atoms come together to form a crystal, the discrete energy levels of individual atoms split and merge into nearly continuous energy bands. The highest band that is completely filled with electrons at $0\,\text{K}$ is the valence band; the next higher band, normally empty, is the conduction band. The gap between them is the forbidden energy gap $E_g$.

The size of $E_g$ decides the class of solid. In a conductor (metal) the valence and conduction bands overlap ($E_g = 0$), so countless free electrons carry current. In an insulator the gap is large ($E_g > 3\,\text{eV}$, e.g. diamond $\approx 6\,\text{eV}$), so almost no electron can jump across. A semiconductor has a small gap ($E_g \approx 1\,\text{eV}$; silicon $1.1\,\text{eV}$, germanium $0.7\,\text{eV}$): at room temperature thermal energy lifts a few electrons into the conduction band, giving modest conductivity that rises with temperature.

A pure semiconductor is an intrinsic semiconductor. When an electron is excited to the conduction band it leaves behind a vacancy called a hole, which behaves as a mobile positive charge. In intrinsic material the electron and hole concentrations are equal: $n_e = n_h = n_i$. Conduction happens by both, but intrinsic conductivity is too small to be useful.

To make it useful we add a tiny, controlled amount of impurity — doping — producing an extrinsic semiconductor. Doping silicon (a tetravalent atom) with a pentavalent donor (P, As, Sb) gives an n-type semiconductor: four electrons bond and the fifth is loosely held, becoming a free electron. Here electrons are the majority carriers and holes the minority carriers. Doping with a trivalent acceptor (B, Al, In) gives a p-type semiconductor: one bond is incomplete, creating a hole, so holes are majority and electrons minority. In every doped sample the law of mass action holds: $n_e\, n_h = n_i^2$. Each doped crystal stays electrically neutral overall.

Joining a p-type and an n-type region in a single crystal forms a p-n junction. Near the boundary, electrons diffuse from n to p and holes from p to n, recombining and leaving behind immobile charged ions — negative acceptor ions on the p-side, positive donor ions on the n-side. This carrier-free zone is the depletion region (width $\sim 10^{-6}\,\text{m}$). The exposed ions set up an internal field and a barrier potential $V_B$ ($\approx 0.3\,\text{V}$ for Ge, $\approx 0.7\,\text{V}$ for Si) that opposes further diffusion until equilibrium.

Applying an external voltage biases the junction. In forward bias (p to +, n to minus) the applied field opposes the barrier: the depletion width shrinks, the barrier lowers, and once $V > V_B$ a large current of majority carriers flows. In reverse bias (p to minus, n to +) the field adds to the barrier: the depletion width grows and only a tiny reverse saturation current (from minority carriers, in the microamp range) flows. The V-I characteristic is therefore strongly non-linear and one-directional — the diode conducts well only one way. Beyond a critical reverse voltage the junction undergoes breakdown.

p-n junction: p and n regions, depletion layer of immobile ions, barrier potential and forward-bias polaritypnDepletion region(immobile ions)- -+ +Barrier potential+-Forward bias: p to +, n to -
1
Worked Example
The energy gap of silicon is $1.1\,\text{eV}$. Find the maximum wavelength of light that can excite an electron from the valence band to the conduction band. (Take $hc = 1240\,\text{eV nm}$.)
Solution
  1. An electron is excited when the photon energy equals at least $E_g$: $E = \dfrac{hc}{\lambda} \ge E_g$.
  2. Maximum wavelength corresponds to minimum photon energy $E = E_g = 1.1\,\text{eV}$.
  3. $\lambda_{max} = \dfrac{hc}{E_g} = \dfrac{1240\,\text{eV nm}}{1.1\,\text{eV}}$.
  4. $\lambda_{max} \approx 1127\,\text{nm}$.

Answer: The maximum wavelength is about $1127\,\text{nm}$ (in the infrared), so silicon responds to infrared and visible light.

2
Worked Example
A silicon sample is doped with phosphorus. State the type of semiconductor formed, the majority and minority carriers, and whether the crystal is charged.
Solution
  1. Phosphorus is pentavalent (5 valence electrons); silicon is tetravalent.
  2. Four electrons form covalent bonds; the fifth is loosely bound and becomes a free electron — the impurity is a donor.
  3. This gives an n-type semiconductor: electrons are the majority carriers, holes the minority carriers.
  4. Each donor contributes a free electron but also a fixed positive ion, so the crystal stays electrically neutral overall.

Answer: n-type; majority carriers are electrons, minority carriers are holes; the crystal as a whole is electrically neutral.

3
Worked Example
In a sample of n-type silicon at room temperature, the intrinsic carrier concentration is $n_i = 1.5\times10^{16}\,\text{m}^{-3}$ and the electron concentration is $n_e = 5\times10^{22}\,\text{m}^{-3}$. Find the hole concentration.
Solution
  1. The law of mass action: $n_e\, n_h = n_i^2$.
  2. $n_h = \dfrac{n_i^2}{n_e} = \dfrac{(1.5\times10^{16})^2}{5\times10^{22}}$.
  3. $n_i^2 = 2.25\times10^{32}\,\text{m}^{-6}$.
  4. $n_h = \dfrac{2.25\times10^{32}}{5\times10^{22}} = 4.5\times10^{9}\,\text{m}^{-3}$.

Answer: The minority (hole) concentration is $4.5\times10^{9}\,\text{m}^{-3}$, far smaller than $n_e$, confirming n-type behaviour.

4
Worked Example
The barrier potential of a silicon p-n junction is $0.7\,\text{V}$ and the depletion width is $1\,\mu\text{m}$. Estimate the electric field across the depletion region.
Solution
  1. The barrier potential is set up across the depletion width $d$.
  2. The (average) electric field is $E = \dfrac{V_B}{d}$.
  3. $E = \dfrac{0.7\,\text{V}}{1\times10^{-6}\,\text{m}}$.
  4. $E = 7\times10^{5}\,\text{V m}^{-1}$.

Answer: The internal electric field is about $7\times10^{5}\,\text{V m}^{-1}$, directed from the n-side to the p-side, opposing diffusion.

5
Worked Example
A semiconductor has resistance that decreases as temperature rises, while a metal's resistance increases. Explain why, using band theory.
Solution
  1. In a semiconductor only a few electrons cross the small gap $E_g$ at room temperature; raising the temperature gives more electrons enough energy to jump into the conduction band.
  2. The number of free charge carriers therefore rises rapidly with temperature, increasing conductivity (decreasing resistance).
  3. In a metal the carrier number is essentially fixed; raising temperature increases lattice vibrations, scattering electrons more.
  4. More scattering reduces carrier mobility, so a metal's resistance increases with temperature.

Answer: A semiconductor's resistance falls with temperature because carrier number grows; a metal's rises because increased scattering lowers mobility while carrier number stays fixed.

6
Worked Example
A p-n junction diode carries a forward current of $10\,\text{mA}$ when forward-biased at $0.7\,\text{V}$, and a reverse saturation current of $5\,\mu\text{A}$. Compare the forward and reverse resistances at these operating points.
Solution
  1. Static (DC) resistance is $R = \dfrac{V}{I}$ at the operating point.
  2. Forward: $R_f = \dfrac{0.7\,\text{V}}{10\times10^{-3}\,\text{A}} = 70\,\Omega$.
  3. Reverse (say at $5\,\text{V}$): $R_r = \dfrac{5\,\text{V}}{5\times10^{-6}\,\text{A}} = 1\times10^{6}\,\Omega = 1\,\text{M}\Omega$.
  4. Ratio $\dfrac{R_r}{R_f} = \dfrac{10^{6}}{70} \approx 1.4\times10^{4}$.

Answer: Forward resistance $\approx 70\,\Omega$, reverse resistance $\approx 1\,\text{M}\Omega$ — about $14000$ times larger, which is why a diode conducts essentially in one direction.

Key Points

  • Conductors have overlapping bands ($E_g = 0$), insulators a large gap ($E_g > 3\,\text{eV}$), semiconductors a small gap ($E_g \approx 1\,\text{eV}$).
  • Intrinsic: $n_e = n_h = n_i$. Extrinsic obeys $n_e\, n_h = n_i^2$. n-type (pentavalent donor) has electrons as majority; p-type (trivalent acceptor) has holes as majority.
  • A p-n junction develops a carrier-free depletion region of immobile ions and a barrier potential ($\approx 0.7\,\text{V}$ Si, $\approx 0.3\,\text{V}$ Ge).
  • Forward bias lowers the barrier and gives a large current; reverse bias widens the depletion region and passes only a small reverse saturation current.
  • The diode V-I characteristic is non-linear and one-directional; conductivity of a semiconductor increases with temperature.
Tap an option to check your answer0 / 4
Q1.The forbidden energy gap of a typical semiconductor at room temperature is about:
Explanation: Semiconductors have $E_g \approx 1\,\text{eV}$ (Si $1.1\,\text{eV}$, Ge $0.7\,\text{eV}$); overlap means a metal and a very large gap means an insulator.
Q2.In a p-type semiconductor the majority carriers are:
Explanation: Doping with a trivalent acceptor creates holes, so holes are the majority carriers and electrons the minority carriers.
Q3.When a p-n junction is reverse-biased, the depletion region:
Explanation: In reverse bias the applied field adds to the barrier field, pulling carriers away from the junction so the depletion region widens.
Q4.The barrier potential of a silicon p-n junction is approximately:
Explanation: The barrier potential is about $0.7\,\text{V}$ for silicon and about $0.3\,\text{V}$ for germanium.